Plasma Studies on Ion Diodes.

Abstract

Cathode plasmas in pulsed high current vacuum diodes have been studied using optical interferometry and spectroscopy. Both aluminum and graphite cathodes were used and the diode current density was varied over a factor of ten. The cathode plasma inventory was seen to increase during the length of the pulse and the plasma density was seen to increase with increasing current density. Spectral line emission from H, CI, CII, and CIII was observed when either cathode was used. It is concluded that cathode was used. it is concluded that cathode plasma expansion is dominated by protons from cathode surface contaminants. (Author)

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Document Details

Document Type
Technical Report
Publication Date
Apr 05, 1983
Accession Number
ADA142183

Entities

People

  • G. Bekefi

Organizations

  • Massachusetts Institute of Technology

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Aluminum
  • Coatings
  • Current Density
  • Diffusion
  • Diffusion Pumps
  • Emission
  • Graphitic Materials
  • Interferograms
  • Interferometers
  • Inventory
  • Materials
  • Measurement
  • Photographic Film
  • Spectral Lines
  • Surface Properties
  • Time Dependence
  • X Rays

Fields of Study

  • Physics

Readers

  • Plasma Physics.
  • Pulsed Power and Plasma Physics.