Photothermal Analysis of Thin Films.
Abstract
Applications of photothermal depth profiling are described. Most recent results demonstrate the use of thermal delay lines and multiplex techniques. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Aug 10, 1984
- Accession Number
- ADA144472
Entities
People
- H. Coufal
- P. Hefferle
Organizations
- International Business Machines Corporation (Armonk, NY)