Direct Writing of Microstructures for Microelectronics
Abstract
A program to investigate direct laser writing for semiconductor processing is described. In this program the following results were obtained: The first reported fabrication of submicrometer diffraction gratings in GaAS; Development of a new technique for writing patterns of the dielectric material, SiO2; Measurement of the conductivity and properties of metal interconnects; The first demonstration of laser-enhanced plasma etching; and The first observation of deep-UV enhanced liquid etching of GaAS.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jul 09, 1984
- Accession Number
- ADA144528
Entities
People
- Richard M. Osgood, Jr.
Organizations
- Columbia University