Integration of Detectors with Optical Waveguide Structures.
Abstract
Progress in several areas regarding the integration of photodetectors with optical waveguide structures is presented. In the area of formation of photodetector arrays on layers of laser-recrystallized polycrystalline silicon, progress has occurred in using antireflection stripes to control the location of grain boundaries. Large areas free of grain boundaries are then available for photodetector fabrication. A 6mm x 5mm test chip containing photodetector arrays, switching MOS transistors, and a number of other test devices has been designed and masks fabricated. This test chip has been fabricated with operation just demonstrated. Detailed testing of this chip is now underway.
Document Details
- Document Type
- Technical Report
- Publication Date
- May 15, 1984
- Accession Number
- ADA146278
Entities
People
- J. T. Boyd
Organizations
- University of Cincinnati