Interaction of UV-Laser Radiation with Molecular Surface-Films.

Abstract

A new process, Laser Photodeposition (based on surface photo-chemistry), has been demonstrated as means for localized material deposition. The spectroscopy, chemical kinetics and transport properties in adsorbate layers of metal alkyls and chlorides have been characterized. Surface-modification processes, based on reactions of monomolecular layers, have been demonstrated. The phenomenon of stimulated surface-plasma-wave scattering has been identified and shown widely important in laser/surface interactions. Applications have been demonstrated in microelectronics. (Author)

Open PDF

Document Details

Document Type
Technical Report
Publication Date
Jun 01, 1984
Accession Number
ADA146311

Entities

People

  • D. J. Ehrlich
  • J. Y. Tsao

Organizations

  • Massachusetts Institute of Technology

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Adsorbates
  • Air Force
  • Chemical Kinetics
  • Chemical Reactions
  • Chemistry
  • Films
  • Kinetics
  • Lasers
  • Materials
  • Materials Science
  • Military Research
  • Photochemical Reactions
  • Plasma Waves
  • Radiation
  • Scattering
  • Spectroscopy
  • Ultraviolet Lasers

Fields of Study

  • Physics

Readers

  • Optical Physics and Photonics.
  • Thin Film Deposition Science.

Technology Areas

  • Directed Energy
  • Microelectronics
  • Microelectronics - Graphene