Electrical Resistivity in Low Resistivity Amorphous Alloys.

Abstract

The temperature dependence of the electrical resistivity in low resistivity (rho < 100 mu ohms cm) amorphous alloys is analyzed in the framework of the diffraction model. The standard diffraction model yields results in qualitative agreement with the available data. However, a quantitative agreement with the data is observed if phonon ineffectiveness effects are included by means of the Pippard-Ziman constraint. A variety of results are presented for ranges of 2kF/kp and electron mean free paths.

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Document Details

Document Type
Technical Report
Publication Date
Oct 01, 1984
Accession Number
ADA147830

Entities

People

  • Lawrence V. Meisel
  • Paul J. Cote

Organizations

  • United States Army Armament Research, Development and Engineering Center

Tags

DTIC Thesaurus Topics

  • Agreements
  • Air Force
  • Alloys
  • Angular Momentum
  • Binary Alloys
  • Diffraction
  • Electrons
  • Metals
  • Military Research
  • Phase Shift
  • Quantum Numbers
  • Scattering
  • Standards
  • Temperature Coefficients
  • Transport Ships
  • Weapon Systems
  • Weapons

Fields of Study

  • Physics

Readers

  • Materials Science and Engineering.

Technology Areas

  • Microelectronics