In Situ Thin Film Measurements.

Abstract

The optical properties of vacuum-deposited thin films were studied in situ during deposition and in air after deposition at the Ecole Nationale Superieure de Physique, Marseille, and at the Optical Sciences Center, University of Arizona, with the objective of a better understanding of aspects of their behaviour determined largely by their microstructure. The basic measurements that were made in both institutes were similar, T and R after deposition and T during deposition, both as functions of wavelength in the visible and near infrared. The techniques for reducing the measurements to values of n, k and of inhomogeneity differed in certain respects but the results were similar. The scientific objectives were: (a) The measurement of the optical constants of thin-films in air after deposition. (b) The measurement of the optical constants of thin films in situ. (c) The study of the differences in the measurements under (a) and (b). (d) The study of aspects of the thin-film deposition process affecting the film performance as measured under (a) and (b). (e) The measurement of optical scattering from thin films and its relation with film structure.

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Document Details

Document Type
Technical Report
Publication Date
Dec 15, 1984
Accession Number
ADA151379

Entities

People

  • E. Pelletier
  • H. A. Macleod

Organizations

  • University of Arizona

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Accuracy
  • Air Force
  • Coatings
  • Computers
  • Detectors
  • Diffraction
  • Electronics
  • Measurement
  • Microstructure
  • Optical Properties
  • Optics
  • Oxides
  • Reflectance
  • Refraction
  • Refractive Index
  • Titanium Dioxide
  • Titanium Oxides

Fields of Study

  • Physics

Readers

  • Small Business Innovation Research Program (SBIR) EDI Research and Innovation.
  • Thin Film Deposition Science.