DARPA/TTO Program IR Binary Optics
Abstract
Binary grating optics consist of microfine rectangular (high-low) relief patterns on a dielectric or a metallic surface. By controlling the depth, width and periodicity of the binary pattern, the amplitude and the phase of an electromagnetic wave can be controlled to produce a variety of optical transfer functions. The lithographic tools for fabrication of binary optics are the ones developed for VLSI circuit fabrication. From a single lithographic mask, planar replica optics can be made in quantity. This technology has broad applicability for tactical missile systems as well as for space systems. In addition to making optics cheaper than by conventional means, binary optics allows the fabrication of unique devices that cannot be made conventionally. These include high-speed rotary scanners, multiplexers, filters, beam shapers and coherent laser adders. The goal of this program is the development of high quality planar optical components using VLSI circuit fabrication techniques. The main elements of the plan are (1) the development of large aperture segmented and piezoelectrically active planar optical surfaces, (2) the development of raster scanning laser telescopes and extension to broadband applications, and (3) the application of diffractive optics technology to the coherent addition of beams from modular laser systems. This report covers progress in the setup of a reactive ion-beam etching laboratory, and the feasibility demonstrations of the coherent beam addition concept with gas lasers. Originator-supplied keywords include: binary optics, defraction.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jun 30, 1984
- Accession Number
- ADA152196
Entities
People
- W. B. Veldkamp
Organizations
- Massachusetts Institute of Technology