Development of Photodetectors.
Abstract
Vapour-phase-epitaxial techniques have been used to fabricate InGaAs/InP avalanche photodiodes having a 'SAM' configuration. The APD's are mesa-etched and are unpassivated. Stable operation up to gains of about 10 has been demonstrated. Noise of all units tested has been somewhat high due to a high value of Kerr (about 0.6), and due to high bulk dark currents. Attempts to develop a satisfactory passivation for the mess-etched devices have been largely unsuccessful. Keywords include: Avalanche Photodiodes; Vapour-Phase-Epitaxy; Passivation.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jan 01, 1985
- Accession Number
- ADA153773
Entities
People
- P. Webb
- R. Mcintyre