Mechanisms of Excitation and Ionization Processes in Sputtering.
Abstract
The primary objective of our research project is to understand the basic mechanisms governing the inelastic outershell processes, i.e. excitation, ionization and neutralization, in particle-solid interactions. To this end, we direct our investigation of the particles sputtered when a solid surface is subjected to energetic ion bombardment. An understanding of the basic mechanisms will allow better interpretation of experimental data obtained by surface analytical techniques which make use of sputtering such as secondary ion mass spectrometry (SIMS), Auger electron spectrometry (AES) and x-ray photoemission spectrometry (XPS). These techniques are commonly used to study microelectronics problems concerning interfairal properties and diffusion of dopants and impurities. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Aug 07, 1985
- Accession Number
- ADA158061
Entities
People
- I. S. T. Tsong
Organizations
- Arizona State University