Surface Production of Negative Hydrogen Ions.

Abstract

Measurements of sputtering of adsorbed hydrogen by cesium ion bombardment have been completed. The temperature of the desorbed negative hydrogen ions is about 0.5 percent of the bombarding energy. An experiment for studying bombardment with cesium and hydrogen ions has been constructed. Formation of cesium coverage due to cesium bombardment of a molybdenum target has been studied. Cesium coverage is only weakly dependent on bombardment energy in the range from 100 to 500 eV. This is due to cesium ion implantation. Originator supplied keywords include: Ion Emission; Atom, Molecule and Ion Impact, Sputtering; Ion Sources.

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Document Details

Document Type
Technical Report
Publication Date
Jul 18, 1985
Accession Number
ADA158949

Entities

People

  • M. Seidl

Organizations

  • Stevens Institute of Technology

Tags

DTIC Thesaurus Topics

  • Air Force
  • Auger Electrons
  • Charged Particles
  • Detection
  • Detectors
  • Electronics
  • Electronics Industry
  • Engineering
  • Ion Beams
  • Ion Implantation
  • Ion Sources
  • Measurement
  • Metals
  • Spectra
  • Spectrometers
  • Standards
  • Surface Roughness

Fields of Study

  • Physics

Readers

  • Plasma Physics.
  • Thin Film Deposition Science.