Studies of Dissolution Phenomena in Microlithography.

Abstract

Laser interferometry is useful for measuring the dissolution rate of thin polymer films. During the dissolution process, polymer in the glassy state is transported into a dilute solution. In some cases, a transition layer can be measured using laser interferometry. This layer is seen as a difference in reflected light intensity between the bare substrate and the maximum during dissolution. When PMMA dissolves in methyl ethyl ketone, the layer is not detectable below a polymer M subscript n of about 30,000. The layer becomes more pronounced as molecular weight of polymer increases.

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Document Details

Document Type
Technical Report
Publication Date
Sep 05, 1985
Accession Number
ADA159482

Entities

People

  • Francisco J. Medellı́n-Rodrı́guez
  • J. A. Jubinsky
  • K. U. Pohl
  • P. D. Krasicky
  • R. J. Groele

Organizations

  • Cornell University School of Chemical and Biomolecular Engineering

Tags

Communities of Interest

  • Ground and Sea Platforms
  • Weapons Technologies

DTIC Thesaurus Topics

  • Abstracts
  • Alkenes
  • Amplitude
  • Chemical Engineering
  • Chemistry
  • Engineering
  • Engineers
  • Films
  • Governments
  • Intensity
  • Materials
  • Microlithography
  • Military Research
  • Molecular Weight
  • Polymeric Films
  • Refractive Index
  • United States

Fields of Study

  • Physics

Readers

  • Optical Physics and Photonics.
  • Polymer Science and Technology
  • Thin Film Deposition Science.

Technology Areas

  • Directed Energy
  • Directed Energy - Lasers