Particle Distributions and Laser-Particle Interactions in an RF Discharge of Silane.

Abstract

A capacitively coupled, RF discharge of silane in argon was studied to determine particle distributions by light scattering and particle photophysics. Ultraviolet lasers cause silicon atom formation in both ground and excited states. Atoms were not formed with 354 or 532 nm excitation, but the discharge chemistry was affected by 354 nm excitation. Keywords: Radiofrequency; silane; plasma chemistry; particles; silicon atom; laser light scattering; laser-induced fluorescence.

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Document Details

Document Type
Technical Report
Publication Date
Nov 20, 1985
Accession Number
ADA161922

Entities

People

  • Kenneth G. Spears
  • Richard M. Roth
  • Timothy J Robinson

Organizations

  • Northwestern University

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Abstracts
  • Chemistry
  • Excitation
  • Fluorescence
  • Laser Induced Fluorescence
  • Lasers
  • Light Scattering
  • Military Research
  • Particles
  • Scattering
  • Security
  • Ultraviolet Lasers

Fields of Study

  • Chemistry
  • Physics

Readers

  • Molecular Photonics/Laser Physics
  • Pulsed Power and Plasma Physics.

Technology Areas

  • Directed Energy
  • Directed Energy - Lasers