Fabrication and Properties of Multilayer Structures.

Abstract

Computer modeling of Si and SiC surfaces and surface processes relevant to crystal growth from the vapor and molecular beam epitaxy has been carried out. Surface point defect energies, ledge energies and face energies, as well as the surface stress tensor, have been calculated. The strongly compressive surface stress tensor has been found to dominate all surface reconstruction processes. Experimental studies of SiC film formation via dual source and single source sputtering processes is described in an attempt to produce almost single crystal SiC films.

Document Details

Document Type
Technical Report
Publication Date
Oct 01, 1985
Accession Number
ADA162347

Entities

People

  • William A. Tiller

Organizations

  • Stanford University

Tags

Communities of Interest

  • Materials and Manufacturing Processes

DTIC Thesaurus Topics

  • Computers
  • Crystal Growth
  • Crystallization
  • Crystals
  • Epitaxial Growth
  • Fabrication
  • Molecular Beam Epitaxy
  • Molecular Beams
  • Point Defects
  • Single Crystals
  • Sputtering

Fields of Study

  • Physics

Readers

  • Materials Science and Engineering.
  • Semiconductor Device Technology