Electron Production, Electron Attachment, and Charge Recombination Process in High Pressure Gas Discharges.
Abstract
The electron productions from two-photon-ionization of CS2, SO2 and (CH3)3N at 193 nm were investigated and their coefficients were measured. The effect of space charge on the electron conduction pulse was observed as a function of charge density and the applied electric field. The electron attachment rate constants of H20 and C3F8 in buffer gases of Ar, N2, and CH4 were measured. The electron attachment rate constants for the gas mixtures of H20-Ar, C3F8-N2 and X3F8-CH4 increase with increasing E/N. These characteristics are useful for the application of opening switches. The electron drift velocities of various gas mixtures were measured. Keywords: Electron production; electron attachment; electron diffusion; charge recombination; electron conduction current; temporary negative ion; space charge effect; plasma decay; electron leakage from plasma; electron attaching gas; excimer laser; parallel-plate drift-tube apparatus; computer modeling; carbon disulfide; sulfur dioxide; methyl nitride.
Document Details
- Document Type
- Technical Report
- Publication Date
- Sep 10, 1985
- Accession Number
- ADA162747
Entities
People
- Long C. Lee
Organizations
- San Diego State University