Investigation of Opening Switch Mechanisms Based on Chemically Reactive Plasmas.
Abstract
An investigation of discharge-induced chemical reactions resulting in high-density product vapors containing strongly attaching gases has been conducted to evaluate the feasibility and potential of such reactions in rapid opening plasma switches. This new concept of employing such reactions to limit and/or interrupt large currents on a microsecond time scale was studied in two element (electrodeless and electroded) devices and in three element (electroded) devices. Bimolecular and unimolecular reactions were considered. The plasma reaction between AlCl sub 3 and SiO sub 2 was studied. The electrical properties of one of the reaction products (SiCl sub 4) is reported herein.
Document Details
- Document Type
- Technical Report
- Publication Date
- Nov 01, 1985
- Accession Number
- ADA163171
Entities
People
- J. M. Proud
- R. B. Piejak
- W. P. Lapatovich