Thermodynamically Stable Metal/III-V Compound-Semiconductor Interfaces.

Abstract

Chemical reactions that occur at a metal/III-V compound-semiconductor interface should be minimized if the change in Gibbs free energy of the bulk materials with respect to any possible reaction products is positive. However, the large positive change in entropy caused by vaporization of the highly volatile group V elements is a very important contribution to the Gibbs free energy of these systems, especially at higher temperatures. Thus, a particular metal/III-V compound-semiconductor interface may be thermodynamically stable at one temperature, but unstable with respect to sublimation of elemental group V species at a higher temperature if the enthalpy change for the reaction is positive. Examination of bulk phase diagrams makes it possible to rationalize the reaction products observed and to predict which will be the most stable interface for any particular metal/III-V system.

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Document Details

Document Type
Technical Report
Publication Date
Feb 28, 1986
Accession Number
ADA165597

Entities

People

  • C. T. Tsai
  • Jeffrey R. Lince
  • John H. Pugh
  • R. Stanley Williams

Organizations

  • University of California, Los Angeles

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • California
  • Chemical Compounds
  • Chemical Reactions
  • Chemistry
  • Compound Semiconductors
  • Diagrams
  • Enthalpy Changes
  • Entropy
  • Films
  • Free Energy
  • Heat Energy
  • Materials
  • Military Research
  • Phase
  • Phase Diagrams
  • Thin Films
  • United States

Fields of Study

  • Chemistry

Readers

  • Materials Science and Engineering.
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene