UV/Ozone Cleaning of Surfaces
Abstract
The UV/ozone methods, which is reviewed in this report, is an effective method of removing a variety of contaminants from surfaces. It is a simple-to-use dry process which is inexpensive to set up and operate. It can rapidly produce clean surfaces, in air or in a vacuum system, at ambient temperatures. Placing properly precleaned surface within a few millimeters of an ozone-producing UV source can produce clean surfaces in less than one minute. The technique can produce clean surfaces in less than one minute. The technique can produce near-atomically clean surfaces, as evidenced by Auger electron spectrosocpy (AES), electron spectroscopy for chemical analysis (ESCA), and ion scattering specroscopy/secondary ion mass spectroscopy (ISS/SIMS) studies. Topics discussed include the variables of the process, the types for surfaces which have been cleaned successfully, the contaminants that can be removed, the construction of a UV ozone cleaning facility, the mechanism of the process, UV/ ozone cleaning in vacuum systems, rate-enhancement techniques, safety consideration, effects of UV/ozone other than cleaning, and applications.
Document Details
- Document Type
- Technical Report
- Publication Date
- May 01, 1986
- Accession Number
- ADA169024
Entities
People
- John R. Vig