Stability of UV Optical Coatings in Hostile Excimer Laser Environments

Abstract

Experiments simulating the exposure of optical coating materials to excimer laser environments are reported. Included are studies of the effect of ion bombardment on Si02 exposed to XeF2; the effect of electron bombardment on a Ag surface (clean, or under thin films of ThF4, MgF2, Si02, or Al203 in the presence of XeF2 or F2; tghe effect of electron bombardment on ThF4 exposed to XeF2; and electron emission from F2 adsorption on tungsten, with a model for the F2 flux dependence and temperature dependence of this phenomenon. Keywords: Optical coatings; excimer laser; laser damage; reactive etching; optical thin films; mass spectroscopy; mass loss; surface reactions; oxide films; halide films; tungsten; chemisorption; chemisorptive emission; Fluorine; and Xenon Fluoride.

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Document Details

Document Type
Technical Report
Publication Date
Jun 15, 1986
Accession Number
ADA169406

Entities

People

  • J. T. Dickinson
  • M. A. Loudiana

Organizations

  • Washington State University

Tags

Communities of Interest

  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Auger Electrons
  • Charged Particles
  • Chemical Reactions
  • Crystal Structure
  • Desorption
  • Electron Beams
  • Electron Emission
  • Electron Energy
  • Energy Levels
  • Fermi Levels
  • Mass Spectroscopy
  • Measurement
  • Photoexcitation
  • Pressure Measurement
  • Quartz Crystal Microbalances
  • Spectra
  • Spectroscopy

Fields of Study

  • Physics

Readers

  • Molecular Photonics/Laser Physics
  • Thin Film Deposition Science.

Technology Areas

  • Directed Energy
  • Directed Energy - Pulsed-Laser Deposition
  • Microelectronics
  • Microelectronics - Graphene