Wavelength Independent Optical Lithography.

Abstract

(Near-Field Diffraction by a Slit: Implications for Super-Resolution Microscopy)--The transmission of light through an infinite slit in a thick, perfectly conducting screen is investigated. The spatial distribution of the near-field energy flux is determined through the formulation of four coupled integral equations, which are solved numerically. Transmission coefficients calculated by this method are in agreement with those determined by an alternative formulation. (Near-Field Scanning Optical Microscopy (NSOM)--A new method for high resolution imaging, near field scanning optical microscopy (NSOM), has been developed. The concepts governing this method are discussed, and the technical challenges encountered in constructing a working NSOM instrument are described. Two distinct methods are presented for the fabrication of well characterized, highly reproducible, sub-wavelength apertures. (Author)

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Document Details

Document Type
Technical Report
Publication Date
Jun 06, 1986
Accession Number
ADA171935

Entities

People

  • Aaron Lewis

Organizations

  • Cornell University School of Applied and Engineering Physics

Tags

Communities of Interest

  • Air Platforms
  • Biomedical
  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Accuracy
  • Air Force
  • Cell Membrane
  • Construction
  • Diffraction
  • Fabrication
  • Far Field
  • Geometry
  • Light Sources
  • Lithography
  • Magnetic Fields
  • Microscopes
  • Near Field
  • Optical Properties
  • Optics
  • Photolithography
  • Quantum Yields

Fields of Study

  • Physics

Readers

  • Electromagnetic Wave Scattering and Antenna Radiation Engineering
  • Finite Element Method (FEM) for solving Partial Differential Equations (PDEs)
  • Nanoscale Plasmonic Nanotechnology