Apparatus for Analysis of Epitaxial Crystal Growth.

Abstract

In this grant funds were requested and received for the purchase of an epitaxial growth and analysis apparatus to investigate the chemistry, photochemistry, and kinetics of growth of semiconductor thin films by metalorganic chemical vapor deposition (MOCVD). The apparatus consists of an epitaxial growth chamber compatible with the inclusion of in situ diagnostic techniques, an excimer dye laser system for use in laser induced fluorescence (LIF) studies of gaseous speices, and a mass spectrometer for in situ analysis of gaseous constituents of MOCVD growth environment. These items were to be incorporated into a system for the investigation of the growth kinetics of MOCVD.

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Document Details

Document Type
Technical Report
Publication Date
Jul 08, 1986
Accession Number
ADA172890

Entities

People

  • Paul Daniel Dapkus

Organizations

  • University of Southern California

Tags

DTIC Thesaurus Topics

  • Air Force
  • Chemical Vapor Deposition
  • Classification
  • Crystal Growth
  • Crystals
  • Decomposition
  • Dye Lasers
  • Epitaxial Growth
  • Laser Induced Fluorescence
  • Lasers
  • Liquid Dye Lasers
  • Mass Spectrometers
  • Mass Spectroscopy
  • Materials
  • Materials Science
  • Scientific Research
  • Semiconductors

Readers

  • Molecular Photonics/Laser Physics
  • Thin Film Deposition Science.

Technology Areas

  • Directed Energy
  • Directed Energy - Pulsed-Laser Deposition
  • Microelectronics
  • Microelectronics - Graphene