Plasma Deposition of Silicon Carbide Thin Films.
Abstract
In the plasma studies area, the model for carbon deposition from methane plasmas was extended to include homogeneous chemical kinetics of both neutral and ionized species, and it was tested with extensive plasma characterization experiments varying plasma excitation and flow parameters. In addition, experiments were completed on methane-hydrogen plasmas, and will be compared to the model. Thermal desorption and dissociation kinetic studies of propylene on silicon surfaces has produced several significant results. It was found that surface reactivity could be controlled by creating damage sites via ion bombardment or by capping such sites with atomic hydrogen. In addition, the adsorption of propane and methane were studied at 120K and compared to the double-bonded propylene using kinetic uptake experiments and Auger surface studies. It was found that no sticking is obtained for hydrocarbon molecules that do not have C=C double bonds. This program has produced several journal articles as well as numerous invited and contributed conference talks and papers. Four preprints are attached which describe the main accomplishments of this program during this reporting period.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jul 30, 1986
- Accession Number
- ADA174970
Entities
People
- John Yates
- L. E. Kline
- Michael J. Bozack
- W. D. Partlow
- W. J. Choyke