Interfacial Structure of In/Pt/GaAs Heterojunction Ohmic Contacts.
Abstract
Graded heterojunction InGaAs ohmic contracts to n-GaAs have been prepared which show improved electrical and morphological properties compared with other diffused contacts. The improvements result primarily from the use of a thin (400 A) Pt layer between the 4000-A In layer and the substrate to control the reaction of the In and the GaAs. A study of chemically etched samples using energy dispersive x-ray (EDX) analysis has revealed the formation of a smooth In(x)Ga(1-x)As heterojunction interface. Keywords include: Heterojunction arsenide, Heterojunction, Indium gallium arsenide, and Ohmic contacts.
Document Details
- Document Type
- Technical Report
- Publication Date
- Sep 30, 1986
- Accession Number
- ADA175102
Entities
People
- Dean C. Marvin
- Martin S. Leung
- Neil A. Ives
Organizations
- The Aerospace Corporation