Rapid Isothermal Processing Systems - An Overview,

Abstract

Reduction in device dimensions to increase speed and packing density has led to the requirements of very controlled thermal processing of semiconductor wafers. Conventional furnaces are used as standard in IC processing however alternate rapid isothermal processing technologies are gaining prominence.

Document Details

Document Type
Technical Report
Publication Date
Aug 01, 1986
Accession Number
ADA176682

Entities

People

  • Sukhdev S. Gill

Organizations

  • Royal Signals and Radar Establishment

Tags

DTIC Thesaurus Topics

  • Carbides
  • Chemical Compounds
  • Compound Semiconductors
  • Electronics
  • Inorganic Carbon Compounds
  • Inorganic Chemicals
  • Packing Density
  • Semiconductors
  • Silicon Carbide
  • Solid State Electronics
  • Standards

Fields of Study

  • Materials science

Readers

  • Integrated Circuit Design and Technology.
  • Systems Analysis and Design
  • Thermal Physics or Thermal Science.

Technology Areas

  • Microelectronics