Deep Levels in Ion Implanted GaAs (Gallium Arsenide)

Abstract

In summary, the DLTS measurements have not found any majority carrier traps with a concentration greater than 1x ten to the 13th power cc after annealing an implanted sample at 850 C The implanted and annealed samples were found to have the same minority carrier trap spectra as the capped and annealed control samples. The capping and annealing results point out the need to investigate other methods such as rapid thermal annealing and capless annealing in order to prevent surface damage on annealing.

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Document Details

Document Type
Technical Report
Publication Date
Jan 23, 1986
Accession Number
ADA177072

Entities

People

  • Harry B. Dietrich
  • Richard Magno

Organizations

  • United States Naval Research Laboratory

Tags

Communities of Interest

  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Annealing
  • Band Gaps
  • Computers
  • Diodes
  • Electronics Laboratories
  • Electrons
  • Energy Bands
  • Fermi Levels
  • Heat Of Activation
  • Ion Implantation
  • Laser Diodes
  • Materials
  • Measurement
  • Military Research
  • Minority Groups
  • Schottky Diodes
  • Spectra

Fields of Study

  • Materials science

Readers

  • Semiconductor Device Technology

Technology Areas

  • Microelectronics