Mechanisms of Carbon and Oxygen Incorporation into Thin Metal Films Grown by Laser Photolysis of Carbonyls.
Abstract
The results of a series of experiments studying metal film growth by low power UV-lser photolysis of metal carbonyls are reported. Small-area Molybdenum, Tungsten, and Chromium films were grown on Silicon substrates by photolysis in a background pressure of 0.1-0.2 Torr of the carbonyl. The different metals exhibited vastly different deposit morphologies. Elemental depth profiling by Auger electron spectroscopy (AES) revealed the presence of large amounts of carbon and oxygen in the films. Ultrahigh vacuum studies of the interaction of 257 and 514 nm radiation with multilayer coverages of Mo(CO)6 and W(CO)6 adsorbed on Si(111)7x7 using high resolution electron energy loss spectroscopy (HREELS), laser induced desorption (LID), and AES were performed to clarify the mechanisms of adsorbed metal carbonyl film growth by low power UV-lser photolysis of metal carbonyls are reported. Small-area Molybdenum, Tungsten, and Chromium films were grown on Silicon substrates by photolysis in a background pressure of 0.1-0.2 Torr of the carbonyl. The different metals exhibited vastly different deposit morphologies. Elemental depth profiling by Auger electron spectroscopy (AES) revealed the presence of large amounts of carbon and oxygen in the films. Ultrahigh vacuum studies of the interaction of 257 and 514 nm radiation with multilayer coverages of Mo(CO)6 and W(CO)6 adsorbed on Si(111)7x7 using high resolution electron energy loss spectroscopy (HREELS), laser induced desorption (LID), and AES were performed to clarify the mechanisms of adsorbed metal carbonyl
Document Details
- Document Type
- Technical Report
- Publication Date
- Jan 01, 1986
- Accession Number
- ADA177358
Entities
People
- C. E. Bartosch
- G. J. Wolga
- N. S. Gluck
- W Ho
- Z. Ying
Organizations
- Cornell University