Characterization of Defects Controlling the Degradation of High Performance Coatings by Juxtaposition of TEM and X-Ray Topography.

Abstract

The techniques of synchrotron x-ray topography and transmission electron microscopy have been combined and applied to the study of defects in evaporated and sputtered thin films on substrates. It has been demonstrated that accurate stress determinations can be made, and defects located, using x-ray topography, and that the defects can be analysed in detail using electron microscopy. The combination of the techniques has been shown to be capable of determining defect behaviors that would be inaccessible to either technique in isolation. Keywords: Synchrotron; X ray Topography; Transmission Electron Microscopy; Thin Films; Coating; Evaporation; Sputtering; Stress; Defects; Tungsten; Chromium; Molybdenum Nickel; Niobium; Silicon; Diffraction; Imaging; Non Destructive Evaluation.

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Document Details

Document Type
Technical Report
Publication Date
Jan 01, 1987
Accession Number
ADA178619

Entities

People

  • A. H. King
  • J. C. Bilello

Organizations

  • Stony Brook University

Tags

DTIC Thesaurus Topics

  • Coatings
  • Crystal Defects
  • Crystal Lattices
  • Crystals
  • Electron Microscopy
  • Engineering
  • Failure Mode And Effect Analysis
  • Films
  • Geometry
  • Grain Growth
  • Grain Size
  • Materials
  • Materials Science
  • Microscopy
  • Thin Films
  • Transmission Electron Microscopy
  • X Rays

Fields of Study

  • Materials science
  • Physics

Readers

  • Nanofabrication and Microfabrication.
  • Surface Engineering/Surface Coating Technology.
  • Systems Analysis and Design

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene