Investigation of the Transverse-Discharge Copper-Vapor Laser.
Abstract
A transverse-discharge copper-vapor laser has been developed using a fast flat-plate Blumlein pulse forming circuit. A specific laser energy density of 50 micor J/CC has been achieved. This is an order of magnitude higher than that achieved by conventional copper-vapor lasers. The high electric field to number density ratio allows operation with high temperatures of up to 1800 C and high buffer gas pressures above atmospheric pressure. (Keywords: Transverse discharge, copper-vapor laser, Vapors, lasers).
Document Details
- Document Type
- Technical Report
- Publication Date
- May 31, 1986
- Accession Number
- ADA178833
Entities
People
- Jin J. Kim
Organizations
- University of New Mexico