Spatially Selective Photoelectrochemistry.
Abstract
This porgram has dealt with applications of photoelectrochemistry to semiconductor technology. Light localized etching and electroplating have been demonstrated for n-GaAs, including imaging with a computer-controlled focused laser light source and crystallographically enhanced photoelectrochemical etching using conventional photoresist masks. These studies have resulted in new processes for high aspect ratio etching in compound semiconductors, and in fabrication of sawtooth Eschelle-type diffraction gratings for spectroscopy and integrated electro-optics.
Document Details
- Document Type
- Technical Report
- Publication Date
- Mar 01, 1987
- Accession Number
- ADA180186
Entities
People
- Margaret E. Langmuir
- Michael M. Carrabba
- R. D. Rauh
- Robert A. Boudreau
- Ronald H. Micheels