Models for the Oxidation of Silicon.

Abstract

This review includes first, a technological overview to define the silicon oxidation problem and the electronic implications; and then a historical perspective which includes a review of the current status of the experimental studies on silicon oxidation; and lastly a critical treatment of the latest oxidation models. It is this authors intent to utilize the Technological Overview and Historical Perspective sections of this review to provide the reader with sufficient information and background to be able to fully appreciate the basis for the currently proposed silicon oxidation models. The origins and reasoning for many of the newest models lie with facts uncovered fifteen years ago. A brief development of some of these facts is given with references. It should be mentioned that all models chosen for discussion have some merit based either on a specific experiment finding or by analogy with other oxidation systems.

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Document Details

Document Type
Technical Report
Publication Date
Jun 03, 1987
Accession Number
ADA181329

Entities

People

  • Eugene A. Irene

Organizations

  • University of North Carolina at Chapel Hill

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Band Gaps
  • Band Structures
  • Carrier Mobility
  • Chemical Reactions
  • Chemistry
  • Electrical Properties
  • Electron Energy
  • Energy Bands
  • Field Effect Transistors
  • Material Degradation Processes
  • Materials
  • Materials Laboratories
  • Materials Processing
  • Materials Science
  • Oxidation
  • Semiconductors
  • Thin Films

Readers

  • Surface Engineering/Surface Coating Technology.
  • Theoretical Analysis.

Technology Areas

  • Microelectronics