Micro-Raman Analysis of Dielectric Thin Films.
Abstract
The long-term motivation of our program Micro-Raman-Analysis of Dielectric Thin Films is the acquisition of an understanding of stress and the role of defects in the growth of optical performance of defects in the growth and optical performance of dielectric thin films. By dielectric films we mearn films comprising materials that are suitable for high-power laser applications in the visible and near UN. Materials with intrinsic band gaps exceeding 3.5 eV are of interest here. Before the initiation of this program there was considerable research activity in the area of narrow band gap materials, mostly semiconductors, in which Raman spectroscopy answered questions of film morphology, doping levels and carrier dynamics.
Document Details
- Document Type
- Technical Report
- Publication Date
- Apr 01, 1987
- Accession Number
- ADA181342
Entities
People
- A. Schmid
Organizations
- University of Rochester