Growth, Characterization and Device Development in Monocrystalline Diamond Films.

Abstract

An apparatus for the growth of diamond films by remote or immersed microwave plasma chemical vapor deposition (CVD) has been designed. This system will also be capable of testing the effect of ultraviolet photon bombardment and heated tungsten filament on diamond growth. Analytical instruments have been purchased to conduct Auger Electron Spectroscopy (AES), X ray Photoelectron Spectroscopy (XDS) and Reverse View Low Energy Electron Diffraction (RVLEED). A chamber to be attached to the CVD apparatus to house these analytical techniques is being designed. Copper single crystal boules have been grown for use as substrates during diamond CVD and a system for the deposition of dielectrics onto diamond has been constructed. Finally, several diamond films from outside sources have been examined by various analytical techniques including AES, XPS, as well as scanning and transmission electron microscopy.

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Document Details

Document Type
Technical Report
Publication Date
Jun 01, 1987
Accession Number
ADA182714

Entities

People

  • G. Lucovsky
  • J. T. Glass
  • K. J. Bachmann
  • Robert F Davis

Organizations

  • North Carolina State University

Tags

Communities of Interest

  • Advanced Electronics
  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Auger Electron Spectroscopy
  • Auger Electrons
  • Chemical Vapor Deposition
  • Crystals
  • Diamond Films
  • Dielectrics
  • Electron Microscopy
  • Electron Spectroscopy
  • Films
  • Mass Spectrometry
  • Materials
  • Materials Science
  • Microscopy
  • Silicon Carbide
  • Spectra
  • Spectrometry
  • Spectroscopy

Fields of Study

  • Materials science
  • Physics

Readers

  • Computer Science/Computer Engineering/Data Science/Digital Signal Processing.
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene