Radiolysis of Poly(chloroacetaldehyde), A Positive E-Beam Resist.
Abstract
The gamma radiolysis and deep ultraviolet photolysis of poly(chloroacetaldehyde), PCA, caused efficient depolymerizations at ambient temperature. The processes are promoted by oxygen; the G(m) value (number of monomer produced per 100 eV absorbed) is 11,000 in the presence of air. The chain scission yield is also high (G(s)=5.5) without crosslinking (G(x)=0). These processes are much less efficient in vacuo; G(m)=1,100, G(s) = 1,100, G(s) = 2.1, G(x) = 0. Depolymerizations stop short of completion due to repolymerization of monomer formed. Bu4NBr has no effect on the gamma-induced depolymerization but 2,6-di-t-butyl-p-cresol retards it suggesting the participation of free radicals rather than ionic species in the processes. This interpretation is supported by electron spin resonance evidences. PCA is highly susceptible to degradation by plasma. However, this susceptibility can be suppressed by DUV crosslinking of PCA with bis(azidoformates) prior to plasma exposure. Halogen containing polymers possessing low ceiling temperature may find usages as self-developing plasma etchable positive resists.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jun 01, 1987
- Accession Number
- ADA183151
Entities
People
- James C. Chien
- Ping-hung Lu
Organizations
- University of Massachusetts Amherst