Impedance and Admittance Measurements at Intercalated n-HfS2/Non-Aqueous Electrolyte Interface.
Abstract
Capacitance, impedance and admittance studies were performed on single crystal n-HfS2 before an after copper intercalation from acetonitrile based electrolyte. The n-HfS2/non-aqueous electrolyte interface was modelled by equivalent R-C circuits containing frequency dependent elements. Electrochemical intercalation by copper into n-HfS2 introduced Faradaic conductance effects. The composition of copper intercalated n-HfS2 in close proximity to the interfacial region was obtained assuming a diffusion coefficient for copper in n-HfS2 of 10 to the 8th sq. cm./sec. The photoanode demonstrated apparent degeneracy for > 0.1 miles of intercalated copper, suggesting tat progressive electronic population of the n-HfS2 conduction band was occurring. Capacitance values for intercalated n-HfS2 were of the order 10 to the 6thF/cm squared. Keywords: Hafnium disulfide, capacitance, impedance, admittance spectroscopy, copper intercalation.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jul 01, 1987
- Accession Number
- ADA183250
Entities
People
- Anthony F. Sammells
- Krystyna W. Semkow
- Nirupama U. Pujare