Ion Plating: Fundamental Processing Studies and Synthesis of High Performance Coatings.
Abstract
Ion plating is a physical vapor deposition process which uses a plasma to modify the microstructure/microchemistry of thin film coatings. This research has directly shown that processing variables such as plasma energy/density; substrate temperature; deposition rate; and substrate surface chemistry directly effect the deposited film microstructure and chemistry. This processing technique allows mechanically strong/chemically graded interface layers to be produced between dissimilar material. Film adhesion with this process is correspondingly excellent. This process was used to produce corrosion and wear resistant hard coatings.
Document Details
- Document Type
- Technical Report
- Publication Date
- Aug 04, 1987
- Accession Number
- ADA184766
Entities
People
- J. M. Rigsbee
Organizations
- University of Illinois Urbana–Champaign