Equilibrium Analysis of the Preparation of In(x)Ga(1-x)As by the VPE-Hydride Technique; Method to Predict the Composition of the Ternary,

Abstract

The equilibrium of the deposition of InxGa1-xAs in the VPE-hydride technique was analyzed in order to derive a method to predict the composition of the ternary from initial partial pressures. An equilibrium expression is derived where the constant is the product of the equilibrium constants for the deposition of the binaries and the activity of the ternary, InxGa1-xAs, is taken as one. The relationship requires the determination of the equilibrium amounts of InxGa1-As deposited in order to determine the composition. Values for InxGa1-xAs deposited in terms of partial pressure were determined at three arsenic pressures. A linear relationship was observed between the partial pressure of the InxAs1-xAs deposited and the initial concentration of arsenic (PAs). Good agreement is achieved between the compositions calculated by the present method and the experimental values reported in the literature.

Open PDF

Document Details

Document Type
Technical Report
Publication Date
Nov 01, 1986
Accession Number
ADA185199

Entities

People

  • Kenneth P. Quinlan

Organizations

  • Rome Laboratory

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Agreements
  • Air Force
  • Air Force Facilities
  • Availability
  • Classification
  • Compound Semiconductors
  • Crystal Growth
  • Epitaxial Growth
  • Equations
  • Experimental Data
  • Gallium Arsenides
  • Optoelectronic Devices
  • Partial Pressure
  • Security
  • Semiconductors
  • Vapor Phases
  • Vapor Pressure

Fields of Study

  • Materials science

Readers

  • Materials Science and Engineering.
  • Semiconductor Device Technology
  • Theoretical Analysis.