Photo-Destruction of Polymethyl Methacrylate in Solutions,
Abstract
During study of mechanism of photo-destruction of polymethyl methacrylate (PMMA) significant difficulty consists in the fact that PMMA absorbs in distant ultraviolet region, and in region of wavelengths >254 nm, emitted by light sources usually utilized in photochemistry, its absorption is actually conditioned on presence of admixtures/impurities of undetermined character. Therefore during irradiation of solid samples of PMMA it remains unclear, what groups or molecules initially absorb light and are the sources of primary active particles. This difficulty it is possible to avoid, if we investigate destruction of PMMA in solutions, where solvent is absorbing component. Therefore in this work was investigated photolysis of the solutions of PMMA in the benzene under the effect of light virtually completely absorbed by benzene.
Document Details
- Document Type
- Technical Report
- Publication Date
- Sep 08, 1987
- Accession Number
- ADA185426
Entities
People
- N. S. Kardash
- V. A. Krongauz
Organizations
- National Air and Space Intelligence Center