The Effect of Ion Implantation on the Corrosion Behavior of a High- Density Sintered Tungsten Alloy

Abstract

The effect of Chromium, Nickel, Tantalum, and Titanium ion implantation on the electrochemical corrosion behavior of a high density sintered tungsten alloy has been investigated in C1- -free and Chlorine ion containing aqueous solution buffered to pH values of 4, 9, and 12. A three sweep potentiodynamic polarization technique was used to compare the polarization behavior of unimplanted and implanted surfaces. The surfaces of the ion- implanted tungsten alloy were characterized by Auger electron spectroscopic (AES) analysis. Keywords: Corrosion resistance, Ion implantation, Polarization measurement, Tungsten alloys, Auger electron spectroscopy, Density, Electrochemical tests.

Open PDF

Document Details

Document Type
Technical Report
Publication Date
Aug 01, 1987
Accession Number
ADA185713

Entities

People

  • Frank C. Chang
  • Milton Levy
  • Sin-shong Lin

Tags

Communities of Interest

  • Space
  • Weapons Technologies

DTIC Thesaurus Topics

  • Air Force
  • Aqueous Solutions
  • Auger Electron Spectroscopy
  • Auger Electrons
  • Corrosion Resistance
  • Current Density
  • Electron Spectroscopy
  • Elements
  • High Density
  • Information Processing
  • Ion Implantation
  • Materials
  • Metals
  • Military Research
  • Oxide Films
  • Polarization
  • Tungsten Alloys

Fields of Study

  • Materials science

Readers

  • Materials Science and Engineering.
  • Semiconductor Device Technology
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene