Apparatus for the Study of Silicon Film Deposition and Silicon Etching.

Abstract

A special vacuum system used to study the surface reactions in thin film deposition and etching was equipped with surface analytical techniques and ion sputtering for preparing and characterizing surfaces. X-ray and ultraviolet photoelectron spectroscopy systems were obtained from Vacuum Science Workshop and installed in a 2-chamber vacuum system along with an ion sputtering gun for sample cleaning. These techniques will be used in conjunction with infrared ellipsometry and modulated molecular beam techniques to elucidate the kinetics and mechanisms of surface reactions of silicon deposition and etching.

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Document Details

Document Type
Technical Report
Publication Date
Jul 31, 1987
Accession Number
ADA187616

Entities

People

  • Jay Benziger

Organizations

  • Princeton University

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Availability
  • Chambers
  • Chemical Engineering
  • Computer Programs
  • Engineering
  • Films
  • Mass Spectrometers
  • Molecular Beams
  • Photoelectrons
  • Power Supplies
  • Security
  • Spectroscopy
  • Surface Reactions
  • Thin Films
  • Universities
  • Vacuum
  • X Rays

Fields of Study

  • Physics

Readers

  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene