High Temperature Oxidation Studies on Alloys Containing Dispersed Phase Particles and Clarification of the Mechanism of Growth of SiO2.

Abstract

In the present investigation, the effects of dispersed SiO2 particles on the high temperature oxidation behavior of and alloys were studied. This study differs from previous investigations in that larger volume percents of SiO2 (5-40 vol%) were incorporated into the alloys. Kinetic studies were done using an automatic recording semi-micro balance under the desired conditions (1 atm O2 and 1273, 1373, 1373K). Surface topographies of oxidized specimens were also prepared and examined optically and by scanning electron microscopy. Standard x ray diffraction techniques were employed to identify the phases present in the scale. Based upon extensive results obtained for the Ni-Cr-SiO2 alloy a model for oxide formation in this system is proposed. The results obtained for the Fe based system will also be presented in this report.

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Document Details

Document Type
Technical Report
Publication Date
Sep 01, 1987
Accession Number
ADA188158

Entities

People

  • B. Munn
  • G. Simkovich
  • S. W. Park

Organizations

  • Pennsylvania State University

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Automatic
  • Crystal Structure
  • Diffraction
  • Electron Microscopy
  • Electrons
  • Grain Boundaries
  • Grain Size
  • High Temperature
  • Materials
  • Microscopy
  • Oxidation Resistance
  • Particles
  • Scanning
  • Scanning Electron Microscopy
  • Standards
  • X Rays
  • X-Ray Diffraction

Fields of Study

  • Materials science

Readers

  • Business Analytics
  • Surface Engineering/Surface Coating Technology.
  • Thermal Physics or Thermal Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene