Chemical Cleaning of Metal Surfaces in Vacuum Systems by Exposure to Reactive Gases.

Abstract

Chemical surface cleaning procedures for metals using oxidation/reduction cycles by exposure to oxidizing (oxygen, nitric oxide) and reducing (Hydrogen, Ammonia) gases are summarized and are briefly discussed for iron, nickel, palladium, copper and silver surfaces. We also present data on the reduction of gaseous contaminants in a stainless steel UHV system by flowing nitric oxide through the system during bake-out Keywords: Vacuum chambers.

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Document Details

Document Type
Technical Report
Publication Date
Nov 10, 1987
Accession Number
ADA188588

Entities

People

  • H. Ruppender
  • M. Grunze
  • O. Elshazly

Organizations

  • University of Maine

Tags

Communities of Interest

  • Materials and Manufacturing Processes
  • Weapons Technologies

DTIC Thesaurus Topics

  • Auger Electron Spectroscopy
  • Auger Electrons
  • Chemical Cleaning
  • Chemical Synthesis
  • Chemistry
  • Crystals
  • Dielectric Gases
  • Electron Spectroscopy
  • Gases
  • Military Research
  • Partial Pressure
  • Phase Transformations
  • Reactive Gases
  • Spectra
  • Stainless Steel
  • Transition Temperature
  • Vacuum Chambers

Readers

  • Internal Combustion Engine (ICE) Technology.
  • Thin Film Deposition Science.