Limited Reaction Processing for Semiconductor Device Fabrication.

Abstract

A new class of semiconductor processing equipment is shown to be feasible. Test equipment has been designed and fabricated which uses a combination of Rapid Thermal and Chemical Vapor Deposition (CVD) technologies to achieve epitaxial growth and deposition of semiconductors and insulators. The trend towards single wafer processing makes Limited Reaction Processing (LRP) particularly relevant to state of the art device fabrication research. Keywords: Rapid thermal processing, Semiconductor devices; Semiconductors; Insulators; Limited reaction processing; Chemical vapor deposition.

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Document Details

Document Type
Technical Report
Publication Date
Dec 01, 1987
Accession Number
ADA190913

Entities

People

  • James F. Gibbons

Organizations

  • Stanford University

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Bipolar Junction Transistors
  • Chemical Vapor Deposition
  • Compound Semiconductors
  • Crystal Structure
  • Electronics Laboratories
  • Fabrication
  • Integrated Circuits
  • Mass Spectrometry
  • Materials
  • Materials Science
  • Modules (Electronics)
  • P-N Junction Diodes
  • Power Electronics
  • Semiconductor Devices
  • Semiconductors
  • Spectra
  • Spectrometry

Fields of Study

  • Materials science

Readers

  • Semiconductor Device Technology
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene