Alkali Reactions with Wall Coating Materials Used in Atomic Resonance Cells.
Abstract
It is well known that the chemisorption of various chlorosilane materials on glass atomic storage vessel walls results in surface coatings that inhibit electronic and nuclear spin relaxation. In the present study the chemical reaction of rubidium, and by analogy other alkali metals, with dichloro-dimethylsilane-treated glass surfaces has been studied. We find evidence that rubidium reacts with a freshly prepared coating to produce H2 and a volatile silicon-containing species. The most reasonable reaction process is postulated to be rubidium reacting with residual silanol groups (Si-OH) found on the surface. As the reaction proceeds these groups would disappear, thus reducing the spin relaxation rate associated with the surface. We believe that this reaction results in the curing of wall coatings reported by other investigators. Concurrently, the gaseous reaction products become impurities within the system.
Document Details
- Document Type
- Technical Report
- Publication Date
- Dec 30, 1987
- Accession Number
- ADA191945
Entities
People
- B. Jaduszliwer
- James C. Camparo
- Robert P. Frueholz
Organizations
- The Aerospace Corporation