An In-Situ Ellipsometric Study of Aqueous NH4OH Treatment of Silicon.
Abstract
In-situ ellipsometry is used to analyze silicon surfaces in an aqueous ammonium hydroxide ambient. The ellipsometric data indicate that a surface which is optically quite similar to bare silicon is obtained when the native silicon dioxide film is etched from a Si substrate by aqueous NH4OH. In contrast, the surface obtained by etching the native oxide in aqueous buffered hydrogen fluoride leads to formation of a residual film on the Si substrate. Roughening of sample surfaces treated with either aqueous NH4OH or BHF is observed by microscopy. The high degree of roughness obtained following NH4OH treatment appears to influence ellipsometric measurements on samples, but this influence is not observed following BHF exposure where less roughness is noted.
Document Details
- Document Type
- Technical Report
- Publication Date
- Mar 25, 1988
- Accession Number
- ADA192752
Entities
People
- Eugene A. Irene
- G. Gould
Organizations
- University of North Carolina at Chapel Hill