Equipment for an Advanced Electron Beam Lithography System.

Abstract

Equipment has been purchased under this grant to develop and build a research electron beam lithography (EBL) system at Stony Brook for the support of research projects on superconducting electronics. The system is based on an Array scanning electron microscope (SEM) which has been modified to accept a laser interferometer to monitor stage position. High precision nonmagnetic stages have been added, and interface electronics have been designed and built to permit control of the beam position and beam blanking by an external computer. The completed system is designed to write over a four inch wafer with a resolution of 30nm and a positional accuracy of 100nm.

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Document Details

Document Type
Technical Report
Publication Date
Jul 14, 1987
Accession Number
ADA192956

Entities

People

  • James Lukens

Organizations

  • Stony Brook University

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Accuracy
  • Air Force
  • Air Force Facilities
  • Brushless Dc Motors
  • Classification
  • Computers
  • Electron Beam Lithography
  • Electron Beams
  • Electron Microscopes
  • Electronics
  • Electrons
  • Interferometers
  • Lithography
  • Microscopes
  • Precision
  • Scanning
  • Scanning Electron Microscopes

Fields of Study

  • Physics

Readers

  • Computer Science/Computer Engineering/Data Science/Digital Signal Processing.
  • Nanofabrication and Microfabrication.

Technology Areas

  • Directed Energy
  • Microelectronics
  • Microelectronics - Microelectromechanical Systems