Low Temperature Film Growth of the Oxides of Zinc, Aluminum, and Vanadium (and Related Systems, Oxides of Gold and Germanium, Nitrides of Aluminum and Tungsten) by Reactive Sputter Deposition.
Abstract
The research involved investigation of process parameter growth environment film property relationships for various binary oxide and nitride films grown on unheated substrates by reactive sputter deposition using an elemental target. In situ optical emission spectroscopy and glow discharge mass spectrometry were used to determine gas phase species in the plasma volume. A battery of techniques were used to characterize (post-deposition) film crystallography, chemistry, microstructure, electrical resistivity, and optical behavior. Keywords: Sputter deposition, Glow discharges, Glow discharge diagnostics, Optical emission, Mass spectrometry, Aluminum oxide, Vanadium, Pentoxide, Gold oxide, Tungsten nitride, Aluminum nitride, Germanium dioxide.
Document Details
- Document Type
- Technical Report
- Publication Date
- Feb 01, 1988
- Accession Number
- ADA193497
Entities
People
- Carolyn R. Aita
Organizations
- University of Wisconsin–Madison