Reactive Plasticizers in Negative E-Beam Resists.

Abstract

Negative electron resists generally exhibit excellent sensitivity, but suffer from swelling during development which results in poor resolution. A new approach to this problem is presented, in which reactive monomers are blended with host polymers to provide sensitive negative resists with improved resolution. Polychloromethylstyrene (PCMS) and VMCH (a terpolymer containing 86% vinyl chloride, 13% vinyl acetate and 1% maleic acid) were both found to be compatible with two reactive monomers, trimethylolpropanetrimethacrylate (TMPTMA) and dipentaerythritolpentaacrylate (DPEPA). Addition of 20% (w/w) of either monomer to PCMs or VMCH resulted in approximately ten fold increases in sensitivity. Keywords: Lithography, Reactive plasticizer, Electron beam.

Open PDF

Document Details

Document Type
Technical Report
Publication Date
May 16, 1988
Accession Number
ADA195161

Entities

People

  • R. Rodriguez
  • S. K. Obendorf
  • Y. M. Namaste

Organizations

  • Cornell University School of Chemical and Biomolecular Engineering

Tags

Communities of Interest

  • Ground and Sea Platforms

DTIC Thesaurus Topics

  • Acids
  • Alkenes
  • Chemical Engineering
  • Chemical Synthesis
  • Chemistry
  • Classification
  • Copolymers
  • Electrons
  • Films
  • Maleic Acid
  • Materials
  • Materials Science
  • Military Research
  • Molecular Weight
  • Plasticizers
  • Polymers
  • Security

Readers

  • Nanofabrication and Microfabrication.
  • Polymer Science and Engineering.

Technology Areas

  • Directed Energy
  • Microelectronics