Synthesis and Properties of CdTe Films
Abstract
This program of research was established to develop CdTe epitaxial films and quantum well structures by molecular beam epitaxy (MBE) and to study their physical properties. During 1983-1985, CdTe films were successfully deposited on various substrates including sapphire, silicon, and gallium arsenide. The films were judged to be of high quality on the basis of photoluminescence and x ray diffraction rocking curve studies. Using the photoassisted MBE technique to prepare n-type CdTe and CdMnTe layers led to the fabrication of field effect transistors based on these materials. The present program has impacted profoundly on the development of the II-VI semiconductors studied and has contributed significantly to a strong resurgence of interest in these materials. The work impacts on the areas of optoelectronics, magnetooptics, integrated optics and infrared detector technology. Keywords: Infrared materials, Cadmium tellurides, Quantum well structures, Epitaxial growth. (MJM).
Document Details
- Document Type
- Technical Report
- Publication Date
- Jun 20, 1988
- Accession Number
- ADA197041
Entities
People
- J. F. Schetzina
Organizations
- North Carolina State University