Proceedings of the Topical Meeting on the Microphysics of Surfaces, Beams, and Adsorbates (2nd) Held in Sante Fe, New Mexico on 16-18 February 1987
Abstract
Partial Contents: The reaction of Si(100) 2 x 1 with NO and NH3: The role of surface dangling bonds; Molecular dynamics simulation of low-energy beam deposition of silicon; Visible laser etching of refractory metals by surface modification; Modulated molecular beam studies of the surface chemistry of silicon reaction with reactive gases; Effects of Ar(+) angle of incidence on the etching of Si with Cl2 and low energy Ar(+) ions; Multiphoton induced desorption of positive ions from barium fluoride; Excited atom production by electron and ion bombardment of alkali halides; Selective area deposition of metals using low energy electron beams; Synchrotron radiation-excited chemical-vapor deposition and etching; Chemiluminescence from F and XeF2 etching reaction with silicon; An in situ infrared study on the interaction of oxygen plasmas with Si and fluorine plasmas with SiO2 surfaces; Ultraviolet-assisted growth of GaAs; Atomic layer growth of GaAs by modulated-continuous-wave laser metal-organic vapor phase epitaxy; Sum-frequency generation on dye-coated surfaces using collinear and noncollinear excitation geometries; Surface diffusion measured by laser-induced desorption: Monte Carlo simulation of effects of surface defects on diffusion; Ion and neutral atomic and cluster sputtering yields of molybdenum; Molecular beam epitaxy growth mechanisms on GaAs (100) surfaces; A study of the mechanism of metal deposition by the laser induced forward transfer process.
Document Details
- Document Type
- Technical Report
- Publication Date
- Oct 31, 1987
- Accession Number
- ADA197601
Entities
People
- D. J. Ehrlich
- Jarus W. Quinn
- T. J. Chuang
- T. M. Mayer
Organizations
- Optica