Adsorption of Chlorine on Clean and on Oxygen Pre-Exposed Al(III)

Abstract

The adsorption of Cl2 (chlorine) on clean and on O2 (oxygen) pre- exposed Al(111) (aluminum) has been studied using Auger and electron energy loss spectroscopies, low energy electron diffraction, temperature programmed desorption and work function measurement. Near room temperature chlorine forms a disordered layer in a two-step process consisting of adsorption at surface sites, dominating at low exposure, followed by population of subsurface sites at higher exposure. Surface adsorption is characterized by a sticking coefficient of about 0.1, an increase in work function of about 1 eV and a desorption peak at about 200 C. The subsurface phase exhibits a smaller sticking coefficient and work function change and no distinct desorption peak. Pre-absorbed 0 blocks formation of subsurface species but not those formed in the initial adsorption step. Cl2 does not displace pre-absorbed 0, but 02 displaces some subsurface Cl. Chlorination is found to occur inhomogeneously rather than uniformly in a layer- by-layer mode. Keywords: Corrosion of aluminum, Halogens, Oxidation.

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Document Details

Document Type
Technical Report
Publication Date
Aug 01, 1988
Accession Number
ADA198005

Entities

People

  • A. S. Glass
  • V. M. Bermudes

Organizations

  • United States Naval Research Laboratory

Tags

Communities of Interest

  • Advanced Electronics
  • Space

DTIC Thesaurus Topics

  • Aluminum Oxides
  • Auger Electron Spectroscopy
  • Auger Electrons
  • Crystal Structure
  • Desorption
  • Electron Spectroscopy
  • Electrons
  • Films
  • Gages
  • Ion Bombardment
  • Ionization Gages
  • Materials
  • Measurement
  • Military Research
  • Monomolecular Films
  • Oxidation
  • Oxide Films

Readers

  • Electrochemical Engineering/ Fuel Cell Technologies
  • Materials Science and Engineering.
  • Mathematics or Statistics

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene